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A cubic doped n-type silicon semiconductor sample at T=300 K, n... | Filo
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2020年2月16日
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A doped n-type silicon sample with 10^16 electrons per cubic centimeter in the conduction band has a resistivity of 5 ×10^-3 Ω·m at 300 K . Find the mean free path of the electrons. Use 0.2 me for the effective mass of the electron. Compare your result with the mean free path of electrons in copper at 300 K . | Numerade
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SOLVED:Is aluminum-doped silicon a p -type or an n -type semiconductor? Explain how conductivity occurs in this semiconductor.
2020年5月1日
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Consider three samples of silicon at T=300 K. The n-type sample is doped with arsenic atoms to a concentration of Nd=5 ×10^16 cm^-3 . The p-type sample is doped with boron atoms to a concentration of Na=2 ×10^16 cm^-3 . The compensated sample is doped with both the donors and acceptors described in the n -type and p -type samples. (a) Find the equilibrium electron and hole concentrations in each sample, (b) determine the majority carrier mobility in each sample, (c) calculate the conductivity
2021年8月16日
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An n -type silicon semiconductor, doped at Nd=4 × 10^16 cm^-3, is steadily illuminated such that g^'=2 × 10^21 cm^-3 s^-1. Assume τn 0=10^-6 s and τp 0=5 × 10^-7 s.(a) Determine the thermal-equilibrium value of EF-EF i. (b) Calculate the quasiFermi levels for electrons and holes with respect to EF i. (c) What is the difference (in eV ) between EF n and EF ?
2021年10月17日
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Consider a bar of p-type silicon that is uniformly doped to a value of Na=2 ×10^16 cm^-3 at T=300 K. The applied electric field is zero. A light source is incident on the end of the semiconductor as shown in Figure P 6.19. The steady-state concentration of excess carriers generated at x=0 is δp(0)=δn(0)=2 ×10^14 cm^-3. Assume the following parameters: μn=1200 cm^2 / V-s, μp=400 cm^2 / V-s, τn 0=10^-6 s, and τp 0=5 ×10^-7 s. Neglecting surface effects, ( a ) determine the steady-state exce
2024年1月22日
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Indicate if each solid forms an n-type or a p-type semiconductor. a. silicon doped with gallium b. germanium doped with antimony | Numerade
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A Schottky diode at T=300 K is formed between tungsten and n -type silicon doped at Nd=10^16 cm^-3. The cross-sectional area is A=10^-4 cm^2. Determine the reverse-biased saturation current at (a) VR=2 V and (b) VR=4 V. (Take into account the Schottky barrier lowering.) | Numerade
2021年6月8日
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An n -type silicon semiconductor, doped at Nd=4 ×10^16 cm^-3, is steadily illuminated such that g^'=2 ×10^21 cm^-3 s^-1. Assume τn 0=10^-6 s and τp 0=5 ×10^-7 s. (a) Determine the thermal-equilibrium value of EF-EF i. (b) Calculate the quasiFermi levels for electrons and holes with respect to EF i. (c) What is the difference (in eV ) between EF n and EF ? | Numerade
2021年6月8日
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Consider a sample of silicon doped at Nd=0 and Na=10^14 cm^-3 . Plot the majority carrier concentration versus temperature over the range 200 ≤T ≤500 K. | Numerade
2021年6月8日
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SOLVED:Indicate if each solid forms an n-type or a p-type semiconductor. a. silicon doped with gallium b. germanium doped with antimony
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Consider silicon at T=300 K that is doped with donor impurity atoms to a concentration of Nd=5 ×10^15 cm^-3 . The excess carrier lifetime is 2 ×10^-7 s. (a) Determine the thermal equilibrium recombination rate of holes. (b) Excess carriers are generated such that δn=δp=10^14 cm^-3. What is the recombination rate of holes for this condition? | Numerade
2021年6月8日
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Silicon is doped with 5 ×10^16 arsenic atoms/cm ^3. (a) Is the material n - or p-type? (b) Calculate the electron and hole concentrations at T=300 K. (c) Repeat part (b) for T=350 K. | Numerade
2022年2月7日
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Silicon at T=300 K is doped with boron atoms such that the concentration of holes is p0=5 ×10^15 cm^-3 ·(a) Find EF-Ev ·(b) Determine Ec-EF ·(c) Determine n0. (d) Which carrier is the majority carrier? ( e ) Determine Efi-EF . | Numerade
2021年6月8日
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Classify the following as n - or p-doped semiconductors: (a) Ga-doped Ge, (b) As-doped Si, (c) ln0,49 Asass^- | Numerade
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