Chemical vapor deposition (CVD) is a vacuum deposition method used to produce high-quality, and high-performance, solid materials. The process is often used in the semiconductor industry to produce thin films. [1]

2021年1月14日 · Chemical vapour deposition (CVD) is a widely used materials processing technology in which thin films are formed on a heated substrate via a chemical reaction of...

化学气相沉积 (CVD) 是半导体行业的一项基础技术，可将材料精确沉积到晶片表面。 该工艺通过化学反应将气态原料转化为固态薄膜。 其基本原理是将气态反应物引入反应器，在反应器中发生一系列复杂的反应。 这些反应的结果是形成一种新材料，均匀地沉积在基底表面。 氮化硅薄膜（Si₃N₄）的形成是最能说明 CVD 作用的实例之一。 该工艺首先将硅烷（SiH₄）和氮气（N₂）引入反应器。 在受控的温度和压力条件下，这些气体发生反应，形成氮化硅薄膜。 这种薄膜在半 …

Chemical vapor deposition, otherwise known as (CVD) is a technique for the deposition of metallic, ceramic, and semiconducting thin films by depositing solid on to a heated surface by a chemical reaction from the vapor or gas phase.

Chemical Vapor Deposition (CVD) is a cornerstone technology in the semiconductor industry, enabling the precise deposition of materials onto wafer surfaces. This process involves the transformation of gaseous raw materials into solid films through chemical reactions.

2025年1月3日 · One of the most effective bottom-up methods for generating thin films and nanoparticles is chemical vapor deposition (CVD). This technique generates constant solid yields by initiating one or more vaporous adsorption classes to …

2023年2月3日 · Chemical vapor deposition (CVD), a bottom-up approach, is one of the most frequently used methods for the synthesis of thin films and nanoparticles. It is a process where one or more gaseous adsorption species react or decompose on a …

2015年6月19日 · Professor Karen Gleason explains chemical vapor deposition, or CVD, a basic tool of manufacturing — used in everything from sunglasses to potato-chip bags — that is fundamental to the production of much of today’s electronics.

Chemical Vapor Deposition (CVD) is the deposition of a solid material onto a heated substrate through decomposition or chemical reaction of compounds contained m the gas passing over the substrate. Many materials such as, silicon nitride, silicon dioxide, non-crystalline silicon, and single crystal silicon, can be deposited through CVD method.

Chemical Vapor Deposition, CVD, is a process by which films are deposited onto a substrate by the reaction between precursors at elevated temepratures and at atmomospheric or lower pressures. Volatile precursors or their by-products are absorbed and react at the wafer surface to produce the desired films.