We report on the optical detection of the spin Hall effect (SHE) as a function of the crystalline structure of sputtered Ta thin films using a magneto-optical Kerr system. The growth rate of Ta...

2005年5月23日 · Ta films with tetragonal crystalline structure (β-phase), deposited by magnetron sputtering on different substrates (steel, silicon, and silicon dioxide), have been studied. In all cases, very highly preferred (001) orientation was observed in X-ray diffraction measurements.

In the present work, we aim to understand the formation and growth mechanism of anodic Ta2O5 (ATO) nanostructures, and the conditions necessary for achieving the desired nanopatterns by adjusting...

2017年3月1日 · Here, we combine in situ and real-time multiple beam optical stress sensor (MOSS) during sputter-deposition of Ta films together with ex situ X-ray diffraction (XRD) and high resolution transmission electron microscopy (HRTEM) to gain insights into the early growth stages and interface properties.

2023年8月7日 · To meet the requirements for integrating superconducting quantum circuits, the ideal method is to grow α-Ta film on a silicon substrate compatible with industrial manufacturing. Here we report...

2012年2月28日 · The XRD results in combination with SEM surface morphology images and hardness values verified formation of nanostructured alpha Ta with an average grain size of ∼45 nm at 0.7 Pa sputtering pressure and randomly textured beta phase or mixed phases at any other sputtering pressures.

In this study, iron-tannic acid nanocomplexes (iron-TA) was synthesized by a simple precipitation method and were used as novel adsorbents for the removal of Methylene blue (MB) dye from water.

The substrate temperature was ~350 ºC. Ta foils used as standards were obtained from Goodfellow Corporation and were 99.9% Ta. To determine the phase of the coatings, x -ray diffraction (XRD) was performed using a Philips x -ray diffractometer with Cu K α radiation operated at 45 kV and 40 mA. XRD patterns for bcc tantalum 4

摘要：为了分析TA10钛合金位错演化，对TA10钛合金做了热模拟压缩实验，并对压缩后的试样进行了X射线衍射（XRD）实验。 根据不同晶面的衍射峰，结合Dunn公式计算出了各晶面的位错密度。

2004年7月7日 · Ta films with tetragonal crystalline structure (beta-phase), deposited by magnetron sputtering on different substrates (steel, silicon and silicon dioxide), have been studied. In all cases, very highly preferred (001) orientation was observed in x-ray diffraction (XRD) measurements.