2020年8月4日 · Herein, we report that ultrathin δ−MoN nanosheets are prepared at 270 °C and 12 atm. WN, VN, and TiN nanosheets are also synthesized by this method. The δ−MoN nanosheets show strong surface...

2020年11月25日 · X-ray diffraction (XRD) measurements were performed using the D8 ADVANCE diffractometer with Ni-filtered Cu–Ka radiation (20 kV, 40 mA) in the 2θ range of 10°–80° at a scanning rate of 5°·min −1. Field-emission scanning electron microscopy (FESEM) images and energy dispersive X-ray spectra were acquired using the JSM-6700F field ...

2019年7月19日 · With these aims in this work, we present a comprehensive study on 3R-MoN 2 with focus on the phase stability and compressibility using high- P synchrotron XRD measurements, leading to the...

2021年5月10日 · γ-Mo 2 N and δ-MoN are the two most important molybdenum nitrides, but controllable preparation of them with high surface area has not been achieved. Herein, we achieved selective preparation of γ-Mo 2 N and δ-MoN.

2022年1月1日 · In this paper, we have prepared MoN x films on p-GaN by direct current (DC) magnetron sputtering methods. The effect of different sputtering powers in deposition chamber on the structure, surface morphology, work function, composition and resistivity of MoN x thin films is comprehensively investigated.

2022年11月22日 · The sputtered films are mainly characterized in four aspects: the film sheet resistivity, the surface topography, the X-ray diffraction (XRD) patterns and the superconducting transition temperature (T c). The sheet resistivity is characterized using a four-probe measurement system (CDE ResMap 178) at room temperature.

2024年3月23日 · The XRD patterns for MoN(buffer)/ZrMoN bi-layer films that are produced using a different DC power for the Zr target are shown in figure 9. The ZrMoN films feature a face-centre cubic (FCC) phase with a (111), (200) and (220) crystallographic orientation of the grains.

2020年6月15日 · X-ray diffraction with a monochromatic Cu-K α radiation (XRD, Philips X’pert Pro) was used to determine the crystal structure of the prepared δ-MoN and δ-NbN thin films. The surface morphology and films thickness were observed by using a field-emission scanning electronic microscope (FE-SEM, Sirion 200, Hillsboro, OR).

Molybdenum nitride thin films were deposited by the atomic layer deposition technique within a temperature range of 350-500 degrees C from molybdenum pentachloride and ammonia. The films were...

2016年3月19日 · 提出了一种合成 MoN 的新路线 ,即在高温高压极端条件下 ,利用 NH4 Cl 还原二氧化钼的 方法合成 MoN ,并对合成产物进行 XRD 表征 。 结果表明 MoN 具有六方结构对称性 ,其晶格常