Role of linear nucleation centres (surface grooves) in formation of macro-pores has been studied for n-type Si. It has been found that linear nucleation centres, contrary to the case of point nucleation pits, initiate formation of semi-regular pore pattern: along the grooves the pores are arranged randomly as a result of self organization ...

2021年6月1日 · Nano-grooves etched through top p-GaN layer were proposed to promote GaN-LED light extraction of small angles. The properties of grating with an optimized period of 500 nm were investigated theoretically and experimentally.

The technique involved enclosing a CuSO 4 absorbent within the layers of the glass, allowing the laser to simultaneously etch high-precision micro-grooves on both glass layers. The resulting micro-grooves in the upper and lower glass substrates exhibited different depths, which can be controlled at the micron level by adjusting the laser ...

2022年1月1日 · This review aims to provide a comprehensive summary for four kinds of mainstream TSV etching methods, i.e., KOH wet etching, laser drilling, deep reactive ion etching and photo-assisted electrochemical etching, including their etching mechanism, process, parameters and hole structure.

This paper proposes a method for fabricating silicon photonic chip edge packaging structure based on bevel deep etching process, which can effectively reduce packaging cost. The prior art realizes precise control of the mold spot conversion structure on the edge of the silicon photonic chip through a vertical etching process.

1985年3月1日 · Photoelectrochemical etching of InP is used to etch deep (80 μm), narrow (20 μm) grooves. The grooves are used to precisely position cleaves in semiconductor lasers and to demonstrate the first wafer processing of long/short cleaved‐coupled‐cavity (C 3) lasers.

2014年4月15日 · We have utilized the photolithographic self-alignment principle to form the etching mask for V-grooves during waveguide core etching. With such designed processes, the waveguides and V-grooves can be fabricated without any lateral displacement. In this letter, we propose a simple method to fabricate V-grooves integrated on silica-on-silicon chips.

1996年2月15日 · This paper presents a novel approach for printing patterns into anisotropically etched grooves of silicon wafers or onto other three-dimensional structures. The key to the technology is electrodeposition of photoresist, which yields a nearly conformal polymer coating even on highly textured surfaces.

2009年6月1日 · Three vertically etched (grooved) silicon structures with lattice constants of 16, 8 and 4 μm were prepared and tested as 1D photonic crystals for applications in the infrared range of the ...

A model is presented which attributes essentially all the etching on the near {111} planes to the misorientation ledges. Grooves of 0.6−μm width and 44−μm depth have been produced. Such grooves have been used to make high−value SiO2 capacitors and …