View (FOV), which is the lateral sample area captured by the camera, depends on additional optics in the optical path to the detector. The Zeta-Series tools have interchangeable coupler optics, which allow for customization of large, medium, or small FOV at a given magnification. The following properties should be considered when selecting

The Zeta-6xx Series system leverages KLA’s experience with process control technology to provide high-performance metrology solutions. The Zeta-6xx Series profiler measure both test and inline product panels, providing the data required to enable process feedback during development and to support process control for high volume manufacturing.

With the T3 & T7 product family, KLA’s ICOS division sets a new standard in the inspection of packaged semiconductor ICs. Its highly flexible design provides a solution for every inspection requirement. Base configurations focusing on minimizing cost of ownership, as well as highly advanced models providing solutions

2024年1月25日 · 视场角是以光学仪器的镜头为顶点，以被测目标的物像可通过镜头看到的最大范围的两条边缘构成的夹角，称为 视场角（Field of View, FOV）。 在机器视觉中，视场是在相机成像仪上捕获的检测区域，镜头焦距和图像传感…

Zeta-20的缺陷复查功能采用检测设备的KLARF文件，并将平台移动到缺陷位置。 用户可以使用高质量的显微镜对缺陷进行检测或者对其高度、厚度或纹理等形貌进行测量。 这提供了2D缺陷检测系统无法获得的额外的缺陷细节。 Zeta-20还可以对缺陷做划线标记，从而更容易在如SEM复检设备等视野有限的设备中找到这些缺陷。 Zeta-20光学轮廓仪对于太阳能电池应用非常适合，针对电池表面反射率极低和极高的材料进行测量。

Developed in 2007, the revolutionary Confocal Grid Structured Illumination (CGSI) is the powerful technology in all Zeta Optical Profilers ... but in a Zeta, it’s called a ZDot TM. Image parameters such as field of view (FOV) and lateral resolution are determined by the combination of camera, coupler and objective choices.

KLA Instruments提供一系列轮廓仪、纳米压痕仪、薄膜厚度仪、电阻测量仪以及缺陷检测和量测系统。 对于行业专家、学术界和其他创新者，KLA Instruments提供值得信赖的测量技术，助力世界实现技术上的突破性发展。

自动拼接功能，可用于大视场 (FOV) 区域测量，如主栅和栅线接触点等; 采用230mm x 230mm 可编程XY 测量台，适用于最新一代太阳能电池产品; 太阳能电池金属栅线的3D真彩色成像; 行业领先的产品性能：可重复性和再现性

The eDR7280 is a new generation wafer defect review and classification system from KLA-Tencor that meets high resolution defect review requirements of advanced semiconductor production and

Results for three different optical apertures are shown (BF, VIB and ECP). The optimal signal-to-noise depends on both the illumination wavelength and optical aperture. These data indicate that both defect types would exhibit sufficient signal-to-noise for simultaneous defect capture by using.