High-accuracy extreme ultraviolet (EUV) interferometry1 has recently been developed to support the fabrication of diffraction-limited projection optical systems for EUV lithography.

2018年10月12日 · The High-NA EUV scanner employs a novel POB design concept with a numerical aperture of 0.55NA that enables 8nm HP resolution and a high throughput. The novel POB design concept tackles the limitations in angular acceptance of the EUV multilayer masks at the increased NA, but also has implications on the system design and usage of the tool.

Optics Fabrication: Flare is determined by the Mid Spatial Frequency roughness • Due to the small wavelength EUV is extremely sensitive to flare

pects, new assembly tooling designs, and contact/non-contact metrology to drastically minimize the mirror mounting stresses. Assembly is performed in our consolidated EUV cleanroom facility combining the POB assembly

The quality and performance of EUV optics has improved over two decades in orders of magnitudes to a level where excellent imaging and image positioning (distortion) is demonstrated by systems from serial production.

POB metrology The POB optical test is built and alignment activities have started. Lessons learned from the mirror tests are being retro-fitted into the POB test. Motion control and sensor feedback system is being programed. Low level functionality shared between all 3 tests, written and already used.

Summary An EUV infrastructure has been set up at Zeiss PPT: Optics for 3100 (27 nm) delivered HVM: Optics for 3300 (22 – 16 nm) at the start of prototyping 3⁄4 Optical design fixed and mechanical design available EUVL has the great potential to be a multigeneration optical lithography technology beyond 11 nm – required:

Delivery of more than 140 EUV systems with 0.33 NA at high and robust performance. More to come due to strong market pull. We are producing mirrors and frames for High-NA EUV optics at full speed. Build up of system integration tools is progressing.

We report on the high-NA infrastructure including mirror polishing, coating, surface figure metrology, mirror handling, and integration tooling. Progress in manufacturing of mechanics, frames, and mirrors for both illuminator and POB will be shown. Conference Presentation

2024年10月22日 · 离子束抛光是利用离子轰击材料表面发生溅射实现原子级材料去除，是一种非接触式的抛光方法，是当前各类高精度光学元件重要的终道修形手段。 图5：德国蔡司的mirror工艺（CCP和IBF） 图6：蔡司反射式mirror的表面粗糙度在过去20年仍在不断迭代优化. 图7：:3400的精度可以将图像从地球投影到月球上，误差小于20厘米. 在蔡司和ASML的资料中，我们可以看到蔡司的反射式Mirror在过去20年一直迭代优化，其3400版本的精度可以达到将图像从地球投影到 …