2025年3月19日 · CVD Equipment Corporation provides precise and reliable chemical vapor deposition and thermal process equipment – enabling tomorrow’s technologies™ in silicon …

2015年3月16日 · Develops and manufactures process equipment solutions for R&D and production applications. Ultra-high purity (UHP) gas and chemical delivery systems for high …

Chemical vapor deposition (CVD) is a vacuum deposition method used to produce high-quality, and high-performance, solid materials. The process is often used in the semiconductor …

2024年7月28日 · CVD 是半导体制造过程中关键工艺之一，在气相反应物的化学反应中生成固态薄膜，沉积在衬底表面。 在半导体行业中，CVD技术广泛应用于沉积介质绝缘层、半导体材料 …

2015年3月17日 · CVDE designs, develops, and manufactures a broad range of chemical vapor deposition, thermal processing, physical vapor transport, gas and chemical delivery control …

A CVD (Chemical Vapor Deposition) machine is a critical piece of equipment in the semiconductor industry, primarily used to deposit thin films of materials like silicon dioxide or silicon nitride …

This chapter introduces new equipment design and a CVD process methodology. The chapter then gives details of the most commonly used subsystems followed by some special …

A CVD apparatus typically consists of a gas delivery system, reactor chamber, energy source, vacuum system, and an exhaust system. The precursors for CVD must be volatile, but stable …

FirstNano®, the R&D product line of CVD Equipment Corporation, enables tomorrow's technologies by designing and building safe, robust, and high-performance turnkey R&D CVD …

2023年7月7日 · Our FirstNano CARBON+™ family of systems is engineered to produce high-quality carbon nanomaterials and carbon composite structures for use in many applications. …