Applications of Aluminum Films. Comparison Between Physical Vapor Deposition (PVD) and Chemical Vapor Deposition (CVD) of Aluminum. Understanding the CVD Process. CVD Using …

Chemical vapor deposition (CVD) is a vacuum deposition method used to produce high-quality, and high-performance, solid materials. The process is often used in the semiconductor …

2010年8月2日 · Find more information on the Altmetric Attention Score and how the score is calculated. Chemical vapor deposition (CVD) is a process routinely used to produce thin films …

This research examined a chemical vapor deposition (CVD) mechanism to deposit uniform conversion coatings onto aluminum alloy substrates. Robust protocols based on solutions of …

After demonstrating the deposition of Al 2 O 3 via chemical vapor deposition (CVD) and ‘pulsed CVD’ routes, the use of ATSB in an atomic layer deposition (ALD)-like process was …

2023年3月1日 · This work demonstrates the use of tris(dimethylamido) aluminum (TDMAA) at 400 and 580 °C to deposit AlN by a pulsed chemical vapor deposition (CVD) method on non-lattice …

2007年12月26日 · The chemical vapor deposition (CVD) of aluminum is now gaining acceptance as a viable metallization technology for the fabrication of sub-0.5 micron interconnects.

1998年5月4日 · In this paper, we report an enabling aluminum plug and interconnect technology that integrates CVD Al with an overlayer of PVD AlCu. DMAH was used as the precursor for …

Production of alumina films has been carried out by a wide variety of methods, including reactive sputtering, evaporation, anodization, sol-gel and chemical vapor deposition (CVD). In this …

For submicron VLSI metallization, chemical vapor deposition (CVD) of aluminum (Al) combines superior CVD step coverage with low resistivity and long experience with Al. The authors …