2019年8月25日 · We conducted conventional θ/2θ XRD and out-of-plane GI XRD measurements, in which the X-ray irradiated a sample at an incident angle (ω) of 1°. The GI XRD method was used to characterize the superficial characteristics of the AZO thin films, and this was compared with the θ/2θ XRD method for bulk characteristics.

In this paper, aluminum-doped zinc oxide (ZnO:Al or AZO) thin films are grown using atomic layer deposition (ALD) and the influence of postdeposition UV–ozone and thermal annealing treatments on...

2010年11月1日 · The structural, surface morphology, electrical and optical properties of the AZO films were characterized by X-ray diffractometry (XRD), atomic force microscopy (AFM), Hall effect measurement and ultraviolet-visible spectrometer, respectively.

2023年10月1日 · Zinc oxide ultra-thin films doping with aluminum (AZO) were produced through radio frequency (rf) sputtering at a fixed pressure of 10 mTorr while varying the rf power between 80 and 140 W.

Structural, optical, and electrical properties of RF magnetron sputtered AZO thin films were analyzed using an X-ray diffraction (XRD) (D8 ADVANCE, Bruker AXS, USA), a UV-VIS spectrophotometer...

运用射频磁控溅射法制备了azo薄膜，用xrd、sem、四探针测试仪、紫外-可见 分光光度计对薄膜的性能进行表征和分析，研究了不同的工艺参数对薄膜结构，形

Figure 1 shows the XRD patterns of the AZO films annealed at various temperatures in the range of 200-700 °C under oxygen ambient. The XRD pattern of AZO-200 films confirms that these films...

本文采用射频磁控溅射法在玻璃衬底表面制备了al2o3掺杂的zno薄膜(azo膜)，使用四探针薄膜方阻仪、xrd和分光光度计对azo薄膜光电性能进行了表征分析。 研究了制备参数和退火条件对AZO薄膜光电性能的影响，获得了制备高透过率(90%)和低方阻(15 Ω/ ) AZO薄膜最佳 ...

掺铝氧化锌 (AZO)薄膜是一种光学透明导电薄膜,在可见光区的透光性能非常好,可用于制造节能玻璃、发光二极管以及薄膜太阳能电池基板。 与ITO (Sn掺杂In 2 O 3)薄膜相比,AZO薄膜的电学与光学特性与其相似 [1]。 但是AZO薄膜的原料丰富、价格低廉、无毒、易于掺杂、热稳定性好和制备温度低,是最具潜力的透明导电薄膜。 制备AZO薄膜的方法,有磁控溅射法 [2] 、脉冲激光沉积法 [3] 、化学气相沉积法 [4] 、超声喷雾热解法 [5] 和溶胶-凝胶法 [6] 等。 磁控溅射法的沉积速率高, …

摘 要： 采用 二 步烧结技术制备 azo 陶瓷靶材， 并采用 xrd 、 sem 和 eds 对 azo 陶瓷靶材进行表征 ，研究 azo 靶材的电阻性能 。结果表明： 当 al 的掺杂量 w(al 2 o 3)为 0.5% 时， azo 靶材出现第二相 znal 2 o 4 ；随 al 掺 杂浓度增加， znal 2 o 4