Atomic layer deposition (ALD) is a thin-film deposition technique based on the sequential use of a gas-phase chemical process; it is a subclass of chemical vapour deposition. The majority of …

2014年6月1日 · Atomic layer deposition (ALD) is a vapor phase technique capable of producing thin films of a variety of materials. Based on sequential, self-limiting reactions, ALD offers …

2017年1月3日 · Atomic layer deposition (ALD) is an emerging and attractive technique for preparing nanoscale ultrathin films because of high uniformity over a large area, accurate...

2023年9月24日 · Atomic layer deposition (ALD) is at the forefront of innovations in thin-film technology, providing intricate control over deposited layers. In typical ALD, a substrate is …

原子层沉积 (Atomic Layer Deposition, ALD)是一种基于化学气相沉积 (CVD) 的高精度薄膜沉积技术，是将物质材料以单原子膜的形式基于化学气相一层一层的沉积在衬底表面的技术。

以原子层为单位沉积技术 “Atomic Layer Deposition (ALD)” 的开发克服了原来的半导体技术局限。 ALD 技术和 CVD, PVD 薄膜生长技术相比具有以下优势：1.大部分ALD 工艺在400度以下的低 …

ALD is the most advanced deposition method in the market, making it possible to create ultra-thin films of exceptional material quality, uniformity, and conformality. ALD is among the fastest …

2002年4月22日 · Based on recent literature, selected ALD processes developed for films used in microelectronics are described as examples and they include deposition of oxide films for …

2022年11月1日 · But in recent times, the atomic layer deposition (ALD) technique has attracted the attention of researchers. In this current review, we have explored the most used …

2022年4月8日 · Atomic layer deposition (ALD) is a thin-film fabrication technique that has great potential in nanofabrication. Based on its self-limiting surface reactions, ALD has excellent …