Sputtering is one of the forms of space weathering, a process that changes the physical and chemical properties of airless bodies, such as asteroids and the Moon. On icy moons, especially Europa, sputtering of photolyzed water from the surface leads to net loss of hydrogen and accumulation of oxygen-rich materials that may be important for life.

2025年1月2日 · Sputtering deposition is a method of creating thin films of a few nanometers to a few micrometers on the desired substrate. In this process, the atoms separated from the surface of the target material are gaseous. These thermodynamically unstable atoms tend to be on a surface in a vacuum chamber.

2014年11月24日 · Sputtering is the thin film deposition manufacturing process at the core of today’s semiconductors, disk drives, CDs, and optical devices industries.

Sputtering targets are crucial in various industries that rely on thin-film technology, including electronics, optics, and energy production. The term “sputtering target” is derived from the material’s function in the sputtering process, a technique within physical vapor deposition (PVD).

2022年11月10日 · Sputtering is a process that enables the creation of film coating made of sputtered atoms. Without this method, it would be nearly impossible to attain the high-quality coating films necessary for LED displays, optical filters, precision optics, and more.

Sputtering is a physical vapor deposition process where atoms are ejected from a solid target material due to bombardment by energetic particles, typically ions.

Sputtering is a physical vapor deposition process where atoms are ejected from a solid target material due to bombardment by energetic particles, typically ions. This technique is widely used in the synthesis of nanomaterials, as it allows for the controlled deposition of thin films and coatings with precise control over composition and structure.

2020年11月26日 · Sputtering is an etching process. The source (known as the target) is bombarded with a high energy species, leading to the ejection of a vapour flux. Sputter deposition therefore uses this flux as the vapour source for film growth.

Use high temperatures at high vacuum to evaporate (eject) atoms or molecules off a material surface. Use ballistic flow to transport them to a substrate and deposit. Film uniformity can be an issue. Alloy evaporation is very complicated and in most cases, not possible.

Sputtering is a fundamental process in materials science and manufacturing that involves the deposition of thin films onto surfaces. It works by bombarding a target material with high-energy ions, typically using an inert gas like argon in a vacuum chamber.