Photolithography at a wavelength of 193 nm in the deep UV with water immersion lenses can ... is projected onto a silicon wafer, which is coated with a light-sensitive material known as a photoresist.
Another important application for UV lasers is wafer inspection in the semiconductor industry. The continuous reduction in the size of features requires inspection tools with shorter and shorter ...
Researchers from Kyushu University and Nitto Denko have so far succeeded in transferring wafers of graphene up to 10 cm in diameter using UV tape. With smaller pieces of UV tape, the sticking and ...
Flatness – The flatness of the wafer chuck is an important specification and is usually specified in microns. For extreme UV photolithography a wafer chuck with high flatness is required for focus.
The purpose of this project is to develop nonlinear optical crystal for generating VUV light at the wavelength below 180 nm in order to realize high-resolution mask and wafer inspection system. We ...