拓荆科技主要从事高端半导体专用设备的研发、生产、销售与技术服务。自成立以来，公司始终坚持自主研发，目前已形成PECVD、ALD、SACVD、HDPCVD、Flowable CVD等薄膜设备产品系列。该产品系列已广泛应用于国内集成电路逻辑芯片、存储芯片等制造产线。此外，公司推出的应用于3D-IC及先进封装领域的混合键合设备产品已实现产业化应用。

为了降低能耗和提高设备效率，研究人员正在探索低温CVD技术，如等离子体增强化学气相沉积(PECVD)等。 技术难度与操作复杂性 半导体化学反应腔室 ...

PECVD等离子体沉积工具Depolab 200将平行板等离子体源设计与直接负载相结合。 可升级性 根据其模块化设计，depolab200可以升级为更大的抽油机、低频电源和额外的燃气管道。 SENTECH控制软件 用户友好功能强大的软件包括模拟GUI，参数窗口，食谱编辑器，数据日志 ...

In thermal CVD, the temperature of the reaction chamber or the substrate is raised to facilitate the reaction. Plasma-enhanced CVD (PECVD) involves the generation of a plasma to provide the energy ...

Let us help you with your inquiries, brochures and pricing requirements Request A Quote Download PDF Copy Download Brochure Chemical Vapor Deposition (CVD) and PECVD ...

In CVD, gaseous “precursor” chemicals flow into a process chamber that contains the silicon wafer. These precursors react on the wafer surface, forming the desired film along with byproducts that are ...

In addition, they implemented a “self-restoring nanocrystalline sowing and vertical growth process for the doped contacts” in a high-frequency plasma-enhanced CVD (PECVD) process, which ...

The ICP CVD process module has been developed to produce high-quality films from room temperature to 400 °C with high-density plasmas at low deposition temperatures and pressures. The PECVD process ...

CVD involves the chemical reaction of gaseous precursors on a heated substrate to form a thin film. CVD techniques, such as plasma-enhanced CVD (PECVD) and low-pressure CVD (LPCVD), enable the ...

AMEC and Naura specialize in etching and chemical vapor deposition (CVD) tools, whereas ACM produces equipment for cleaning, ...