First, because EUV light is absorbed by air (in contrast with 193 nm light), the entire optical system, from source to wafer, must be enclosed in a near-vacuum environment. Second, because EUV ...

EUV, extreme ultraviolet lithography, is nearly completely associated with the Dutch company ASML, the only maker of EUV ...

ELMIC aims to advance the basic science driving the integration of new materials and processes into future microelectronic ...

The Lawrence Livermore National Laboratory is working on a petawatt-class thulium laser that is said to be 10 times more ...

Silicon chip manufacturers trying to keep up with Moore's law are most likely breathing a sigh of relief that the US firm Cymer has recently delivered an extreme ultraviolet (EUV) light source to ...

The project aims for the next evolution of EUV lithography, centered around the lab-developed driver system named the Big ...

ASML作为EUV光刻机的先锋，一直以来都被认为是不可或缺的技术提供者。 recent developments in 2024 have brought unexpected ...

The LLNL-led initiative will evaluate the Big Aperture Thulium (BAT) laser technology to enhance EUV source efficiency by ...

Scientists have planned to conduct a demonstration pairing the compact high-rep-rate BAT laser with technologies that generate sources of EUV light using shaped nanosecond pulses and high-energy x ...

Decades of cutting-edge laser, optics and plasma physics research at Lawrence Livermore National Laboratory (LLNL) played a key role in the underlying ...

And theoretically, the best case for EUV mask inspection is actinic inspection. That uses an EUV light source for inspection of phase defects. That system is also in the field. All of those new ...

Corning has introduced its new ultra-low expansion (ULE) material that is designed to withstand ever increasing power of ...